TitleProduct

Silicon Aluminum Sputtering Target

  • Price:

    Negotiable

  • minimum:

  • Total supply:

  • Delivery term:

    The date of payment from buyers deliver within days

  • seat:

    Jiangsu

  • Validity to:

    Long-term effective

  • Last update:

    2017-12-24 07:33

  • Browse the number:

    288

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Jiangyin Entret Coating Technology Co., Ltd.
Contactaixin:

Miss Ada(Mr.)  

Email:

telephone:

phone:

Arrea:

Jiangsu

Address:

1st Floor, Energy Building B-Block, Powerise Industrial Park, Wuxi, Jiangsu, China 214400

Website:

http://jyentret.jinghan51.com/

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99.95% High purity SiAl sputtering Target
1.Detail:

Content Si: 90 wt% ,Al:10 wt%
Purity ≥99.95%
Relative Density ≥96%
Resistivity ≤10mΩ·cm
Specification length(max)4000mm*thickness(max)13mm; linearity:05.mm
Processing Mode Plasma spraying 
Application Low emission glass
Delivery time 2 Weeks after receipt of deposit

2.Why Us :
 
High purity 99.9%
Uniform composition element Deviation Index ±2wt%
Smaller grain <100μm
High density
2.251g/cm
Low resitivity 7 mΩ·cm


3: Production Workflow Chart 





4:Packing :

According to customers' request.

 


5:Impurity Content:

Fe<=0.03% Cd<=0.0005% Pb<=0.0005% As<=0.0002%
Mn<=0.001% Cu<=0.0005% K<=0.001% Ca<=0.001%

6.Independent intelligent property right

We have obtained 11 independent intelligrnt property rights about sputtering targets and plasma spraying equipments .